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In situ monitoring of stress change in GeTe thin films during thermal annealing and crystallization

• Authors : B. Ben Yahia; M.S. Amara; M. Gallard

Subjects: Electronics; TK7800-8360; Technology (General)

• Source: Micro and Nano Engineering, Vol 1, Iss , Pp 63-67 (2018)

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Bragg coherent diffraction imaging of single 20 nm Pt particles at the ID01-EBS beamline of ESRF

• Authors : M.-I. Richard; S. Labat; M. Dupraz ...

Subjects: Bragg coherent diffraction imaging; X-ray instrumentation; Extremely Brilliant Source

• Source: Journal of Applied CrystallographyJournal of Applied Crystallography, 2022, 55, pp.621-625. ⟨10.1107/s1600576722002886⟩

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Strain release management in SiGe/Si films by substrate patterning

• Authors : MONDIALI, VALERIA; BOLLANI, MONICA; CHRASTINA, DANIEL ...

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DOI:10.1016/J.TSF.2012.02.032 Strain inhomogeneity in copper islands probed by coherent x-ray diffraction

• Authors : G. Beutier; M. Verdier; G. Parry ...

• Source: http://hal.inria.fr/docs/00/80/70/39/PDF/SS6_proceeding-v3.pdf.

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Coherent nanoscale X-ray probe for crystal interrogation at ID01, ESRF – The European Synchrotron

• Authors : Hamid Djazouli; Tao Zhou; M-I. Richard ...

Subjects: Diffraction; Wavefront; Materials science

• Source: Materials & Design, Vol 119, Iss, Pp 470-471 (2017)Materials and DesignMaterials and Design, Elsevier, 2017, 119, pp.470-471. ⟨10.1016/j.matdes.2017.01.092⟩Materials & Design

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Imaging structure and composition homogeneity of 300 mm SiGe virtual substrates for advanced CMOS applications by scanning X-ray diffraction microscopy

• Authors : Peter Zaumseil; Marvin Hartwig Zoellner; Christian Reich ...

Subjects: Diffraction; Materials science; SiGe

• Source: ACS applied materials & interfaces, vol 7, iss 17Zoellner, MH; Richard, MI; Chahine, GA; Zaumseil, P; Reich, C; Capellini, G; et al.(2015). Imaging structure and

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