نتائج البحث

Coating layer on samples with roughness: numerical study for coherent Fourier scatterometry

• Authors : Kolenov, D. (author); Pereira, S.F. (author)

Subjects: multilayer; Optical metrology; roughness

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Large-Area Scatterometry for Nanoscale Metrology

• Authors : Rivas, Jaime Gómez; Ramezani, Mohammad; Verschuuren, Marc

Subjects: Conferentiebijdrage; Conference contribution

• Source: von Freymann, Georg, Blasco, Eva, Chanda, Debashis (Ed.), Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI, SPIE. [ISBN 9781510659728]

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Wavelength influence on the determination of subwavelength grating parameters by using optical scatterometry

• Authors : Šiaudinyte, L. (author); Pereira, S.F. (author)

Subjects: Coherent Fourier scatterometry; Coherent light; Far field

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Sensitivity analysis of optical scatterometry technique for high-aspect ratio trench measurement

• Authors : Grasland, Justine; Le Cunff, Delphine; Pham, Hoang Lam ...

• Source: Metrology, Inspection, and Process Control XXXVII ; page 10

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Forward simulation of coherent beams on grating structures for coherent scatterometry

• Authors : Hammerschmidt, Martin; Zschiedrich, Lin; Siaudinyté, Lauryna ...

• Source: Modeling Aspects in Optical Metrology IX ; page 25

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Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing

• Authors : Agocs, E.; Bodermann, B.; Burger, S.

Subjects: Scatterometry; OCD; ellipsometry

• Source: In Campo, E.M. . [Ed.] Nanoengineering Fabrication, Properties, Optics, and DevicesSPIE, 2015 Proceedings of SPIE ; 9556 , p. 955610 1 12

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Real-time profile shape reconstruction using dynamic scatterometry

• Authors : Soulan, Sébastien; Besacier, Maxime; Schiavone, Patrick ...

Subjects: scatterometry; real time; diffractionSan Jose (CA); United States

• Source: Proceedings of SPIE ; Metrology, Inspection, and Process Controlfor Microlithography XXI ; https://hal.science/hal-00137876 ; Metrology, Inspection, and Process

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In-line etching process control using dynamic scatterometry

• Authors : Soulan, S.; Besacier, M.; Leveder, T. ...

Subjects: Scatterometry; Real time; Process monitoringMunich; Germany

• Source: Proceedings of SPIE ; Modeling Aspects in Optical Metrology ; https://hal.science/hal-00168934 ; Modeling Aspects in Optical Metrology, 2007, Munich, Germany. pp.11111,

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Wavelength influence on the determination of subwavelength grating parameters by using optical scatterometry

• Authors : Siaudinyte, Lauryna; Pereira, Silvania;

• Source: Metrology, Inspection, and Process Control for Microlithography XXXIV ; page 84

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Methods for optical modeling and cross-checking in ellipsometry and scatterometry

• Authors : Petrik, P. (author); Fodor, B. (author); Agocs, E. (author)

Subjects: conference paper; Text

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