Item request has been placed! ×
Item request cannot be made. ×
loading  Processing Request

نتائج البحث

Filter
  • 1-10 ل  10 نتائج ل ""masse spectrométrie""
Item request has been placed! ×
Item request cannot be made. ×
loading  Processing Request

Study and development of plasma etching processes for metal gate patterning of CMOS technologies: application to a Si/TiN/HfO2 gate stack

Subjects: Front end; Process; Plasma

  • Source: Micro et nanotechnologies/Microélectronique. Université Joseph-Fourier-Grenoble I, 2006. FrançaisMicro et nanotechnologies/Microélectronique. Université Joseph-Fourier-Grenoble I, 2006.

تفاصيل العنوان

×
  • 1-10 ل  10 نتائج ل ""masse spectrométrie""