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Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials

• Authors : Zhigang Xiao; Kim Kisslinger; Sam Chance

Subjects: hafnium dioxide (hfo2) thin film; zirconium dioxide (zro2) thin films; complementary metal-oxide semiconductor (cmos) integrated circuits

• Source: Crystals, Vol 10, Iss 2, p 136 (2020)

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Comparison of Hafnium Dioxide and Zirconium Dioxide Grown by Plasma-Enhanced Atomic Layer Deposition for the Application of Electronic Materials

• Authors : Samuel Banks; Zhigang Xiao; Kim Kisslinger

Subjects: Materials science; General Chemical Engineering; Analytical chemistry

• Source: Crystals, Vol 10, Iss 2, p 136 (2020)CrystalsVolume 10Issue 2

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Hafnia-based resistive switching devices for non-volatile memory applications and effects of gamma irradiation on device performance.

• Authors : Arun, N.¹; Kumar, K. Vinod²; Pathak, A. P.²

• Source: Radiation Effects & Defects in Solids: Incorporating Plasma Techniques & Plasma Phenomena. Mar/Apr2018, Vol. 173 Issue 3/4, p239-249. 11p.

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