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Lithography: Principles, Processes and Materials

• Authors : Hennessy, Theodore C.

Subjects: Microlithography; MicrofabricationTECHNOLOGY & ENGINEERING / Electronics / Circuits / General

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具有双重显影特性的多用途单分子树脂化学放大光刻胶.

• Authors : 苑晓冬^1,2; 陈金平^1,2 ; 于天君¹

• Source: Chinese Journal of Applied Chemistry. Jul2024, Vol. 41 Issue 7, p1024-1034. 11p.

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Poisson Effect‐Assisted Replication Lithography for Rapid Fabrication of Three‐Dimensional Microstructures.

• Authors : Kim, Minsu¹ (AUTHOR); Kyeong, Dokyung¹ (AUTHOR); Kwak, Moon Kyu¹ (AUTHOR)

• Source: Small Structures. Jun2024, Vol. 5 Issue 6, p1-9. 9p.

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Multivariate Model for Characterising Physical Dot Gain, Chroma and Lightness in Offset Lithography.

• Authors : Mahajan, M.¹ ; Arulmozhi, A.¹

Subjects: *LITHOGRAPHY; *PACKAGING industry; *PRINTING

• Source: Progress in Color, Colorants & Coatings. Oct2024, Vol. 17 Issue 4, p365-380. 16p.

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Fractional Talbot Lithography for Predesigned Large-Area Liquid-Crystal Alignment.

• Authors : Ji, Zhichao^1,2 (AUTHOR) ; Gan, Zenghua² (AUTHOR) ; Wang, Yu² (AUTHOR)

• Source: Materials (1996-1944). Oct2024, Vol. 17 Issue 19, p4810. 13p.

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Optimization Design Method of a 6‐DOF Micromanipulation Mechanism for Extreme Ultraviolet Projection Lithography Objective Lens.

• Authors : Li, Shiyu^1,2,3,4 (AUTHOR); Liu, Junbo^1,2,3 (AUTHOR); Zhou, Ji^1,2,3 (AUTHOR)

• Source: Shock & Vibration. 7/19/2024, Vol. 2024, p1-12. 12p.

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ELECTRON BEAM LITHOGRAPHY PROCESS QUALITY IMPROVEMENT BY ROBUST ENGINEERING APPROACH.

• Authors : Koleva, Lilyana¹; Asenova-Robinzonova, Asya¹; Koleva, Elena^1,2

• Source: Journal of Chemical Technology & Metallurgy. 2024, Vol. 59 Issue 2, p439-450. 12p.

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Multiphysics machine learning framework for on-demand multi-functional nano pattern design by light-controlled capillary force lithography.

• Authors : Chapagain, Ashish¹ (AUTHOR); Cho, In Ho¹ (AUTHOR)

• Source: Communications Physics. 7/2/2024, Vol. 7 Issue 1, p1-12. 12p.

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Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists.

• Authors : Liu, Junjun¹ (AUTHOR) ; Wang, Dong¹ (AUTHOR); Li, Yitan¹ (AUTHOR)

Subjects: *PHOTORESISTS; *ELECTRON beam lithography; *LITHOGRAPHY

• Source: Polymers (20734360). Mar2024, Vol. 16 Issue 6, p825. 10p.

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Contact-interference Hybrid lithography: Toward Scalable Fabrication of cross-scale periodic micro structure and demonstration on infrared micro polarizer array

• Authors : Lu, Tianshi; Deng, Fuyuan; Wei, Yufeng

Subjects: Physics - Optics

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