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  • 1-10 ل  12 نتائج ل ""surface modification""

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Conference

Investigation of plasma species, etch products and surface modification during etching of Ge, Sb and Se-based materials in CH 4 -H 2 -Ar plasmas

Subjects: [SPI]Engineering Sciences [physics]; [CHIM]Chemical Sciences; [PHYS]Physics [physics]Kyoto; JapanKyoto, Japan

  • Source: 25th International Symposium on Plasma Chemistry (ISPC25)https://hal.science/hal-0467579325th International Symposium on Plasma Chemistry (ISPC25), May 2023, Kyoto,

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Conference

Investigation of plasma species, etch products and surface modification during etching of Ge, Sb and Se-based materials in CH4-H2-Ar plasmas

Subjects: plasma etching mass spectrometry Ge-Sb-Se etch products XPS; plasma etching; mass spectrometryKyoto; JapanKyoto, Japan

  • Source: 25th International Symposium on Plasma Chemistry (ISPC25)https://hal.science/hal-0467578825th International Symposium on Plasma Chemistry (ISPC25), Takayuki Watanabe - Kyushu University

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Conference

Investigation of plasma species, etch products and surface modification during etching of Ge, Sb and Se-based materials in CH 4 -H 2 -Ar plasmas

Subjects: [SPI]Engineering Sciences [physics]; [CHIM]Chemical Sciences; [PHYS]Physics [physics]Kyoto; JapanKyoto, Japan

  • Source: 25th International Symposium on Plasma Chemistry (ISPC25)https://hal.science/hal-0467579325th International Symposium on Plasma Chemistry (ISPC25), May 2023, Kyoto,

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Conference

Investigation of plasma species, etch products and surface modification during etching of Ge, Sb and Se-based materials in CH4-H2-Ar plasmas

Subjects: plasma etching mass spectrometry Ge-Sb-Se etch products XPS; plasma etching; mass spectrometryKyoto; JapanKyoto, Japan

  • Source: 25th International Symposium on Plasma Chemistry (ISPC25)https://hal.science/hal-0467578825th International Symposium on Plasma Chemistry (ISPC25), Takayuki Watanabe - Kyushu University

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Conference

Investigation of plasma species, etch products and surface modification during etching of Ge, Sb and Se-based materials in CH 4 -H 2 -Ar plasmas

Subjects: [SPI]Engineering Sciences [physics]; [CHIM]Chemical Sciences; [PHYS]Physics [physics]Kyoto; JapanKyoto, Japan

  • Source: 25th International Symposium on Plasma Chemistry (ISPC25)https://hal.science/hal-0467579325th International Symposium on Plasma Chemistry (ISPC25), May 2023, Kyoto,

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Conference

Investigation of plasma species, etch products and surface modification during etching of Ge, Sb and Se-based materials in CH4-H2-Ar plasmas

Subjects: plasma etching mass spectrometry Ge-Sb-Se etch products XPS; plasma etching; mass spectrometryKyoto; JapanKyoto, Japan

  • Source: 25th International Symposium on Plasma Chemistry (ISPC25)https://hal.science/hal-0467578825th International Symposium on Plasma Chemistry (ISPC25), Takayuki Watanabe - Kyushu University

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Conference

Direct bonding of semiconductors by through-transmission laser welding

Subjects: laser welding; laser processing; semiconductorHirosaki; Japan

  • Source: The 24th International Symposium on Laser Precision Microfabrication – LPM2023 ; The 24th International Symposium on Laser Precision Microfabrication (LPM2023) ; https://amu.hal.science/hal-04105830

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Direct bonding of semiconductors by through-transmission laser welding

Subjects: laser welding; laser processing; semiconductorHirosaki; Japan

  • Source: The 24th International Symposium on Laser Precision Microfabrication – LPM2023 ; The 24th International Symposium on Laser Precision Microfabrication (LPM2023) ; https://amu.hal.science/hal-04105830

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Conference

[Invited] Material processing by atmospheric pressure plasma jets

Subjects: PECVD process; Atmospheric pressure plasma; plasma jetNagoya; Japan

  • Source: Workshop in memory of R. d'Agostino ; https://hal.science/hal-02958285 ; Workshop in memory of R. d'Agostino, Nagoya Institue of Technology, Mar 2019, Nagoya, Japan

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Conference

[Invited] Material processing by atmospheric pressure plasma jets

Subjects: PECVD process; Atmospheric pressure plasma; plasma jetNagoya; Japan

  • Source: Workshop in memory of R. d'Agostino ; https://hal.science/hal-02958285 ; Workshop in memory of R. d'Agostino, Nagoya Institue of Technology, Mar 2019, Nagoya, Japan

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  • 1-10 ل  12 نتائج ل ""surface modification""