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Dissertation/ Thesis

HWCVD Technology Development Addressed to the High Rate Deposition of mi-c-Si:H

  • Authors : Nos Aguilà, Oriol; University/Department: Universitat de Barcelona. Departament de Física Aplicada i Òptica; ...

Subjects: Deposició en fase de vapor; Deposición en fase de vapor; Vapor-plating

  • Source: TDX (Tesis Doctorals en Xarxa)

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