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Subject : polishing
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Academic Journal

Germanium Surface Wet-Etch-Reconditioning for Porous Lift-off and Substrate Reuse

Subjects: Germanium Wet etching Porous Germanium Polishing Substrate Reuse Porous Lift-off; Germanium; Wet etching

  • Source: ISSN: 1369-8001 ; Materials Science in Semiconductor Processing ; https://hal.science/hal-04214455 ; Materials Science in Semiconductor Processing, 2023, 168, pp.107851.

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Academic Journal

Germanium Surface Wet-Etch-Reconditioning for Porous Lift-off and Substrate Reuse

Subjects: Germanium Wet etching Porous Germanium Polishing Substrate Reuse Porous Lift-off; Germanium; Wet etching

  • Source: ISSN: 1369-8001 ; Materials Science in Semiconductor Processing ; https://hal.science/hal-04214455 ; Materials Science in Semiconductor Processing, 2023, 168, pp.107851.

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Academic Journal

Germanium Surface Wet-Etch-Reconditioning for Porous Lift-off and Substrate Reuse

Subjects: Germanium Wet etching Porous Germanium Polishing Substrate Reuse Porous Lift-off; Germanium; Wet etching

  • Source: ISSN: 1369-8001 ; Materials Science in Semiconductor Processing ; https://hal.science/hal-04214455 ; Materials Science in Semiconductor Processing, 2023, 168, pp.107851.

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Academic Journal

Germanium Surface Wet-Etch-Reconditioning for Porous Lift-off and Substrate Reuse

Subjects: Germanium Wet etching Porous Germanium Polishing Substrate Reuse Porous Lift-off; Germanium; Wet etching

  • Source: ISSN: 1369-8001 ; Materials Science in Semiconductor Processing ; https://hal.science/hal-04214455 ; Materials Science in Semiconductor Processing, 2023, 168, pp.107851.

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Academic Journal

Germanium Surface Wet-Etch-Reconditioning for Porous Lift-off and Substrate Reuse

Subjects: Germanium Wet etching Porous Germanium Polishing Substrate Reuse Porous Lift-off; Germanium; Wet etching

  • Source: ISSN: 1369-8001 ; Materials Science in Semiconductor Processing ; https://hal.science/hal-04214455 ; Materials Science in Semiconductor Processing, 2023, 168, pp.107851.

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  • 1-5 ل  5 نتائج ل ""Substrate reuse""