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Green Deep-UV photoresist based on Chitosan for microelectronics

• Authors : Sysova, Olha; Durin, Paule; Gablin, Corinne ...

Subjects: Photolithography; chitosan; photoresist

• Source: ISSN: 0021-8995.

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Chitosan as a Water-Developable 193 nm Photoresist for Green Photolithography

• Authors : Sysova, Olha; Durin, Paule; Gablin, Corinne ...

Subjects: Photolithography; chitosan; photoresist

• Source: ISSN: 2637-6105 ; ACS Applied Polymer Materials ; https://hal.science/hal-03703059 ; ACS Applied Polymer Materials, 2022, 4 (6),

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Resists for deep-UV photolithography based on aqueous solutions of biomass-derived polysaccharides ; Résines pour la photolithographie UV-profonde à base de solutions aqueuses de polysaccharides issus de la biomasse

• Authors : Sysova, Olha;

Subjects: Photolithograpy; Chitosan; Photoresist

• Source: https://theses.hal.science/tel-04412628 ; Chimie théorique et/ou physique. Université de Haute Alsace - Mulhouse, 2023. Français. ⟨NNT : 2023MULH6666⟩.

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Résines pour la photolithographie UV-profonde à base de solutions aqueuses de polysaccharides issus de la biomasse ; Resists for deep-UV photolithography based on aqueous solutions of biomass-derived polysaccharides

• Authors : Sysova, Olha;

Subjects: Photolithographie; Chitosane; Photosensible540; 530; 600

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Chitosan as a Water-Developable 193 nm Photoresist for Green Photolithography

• Authors : Olha Sysova; Paule Durin; Corinne Gablin ...

Subjects: Photolithography; [CHIM.POLY] Chemical Sciences/Polymers; [CHIM.POLY]Chemical Sciences/Polymers

• Source: ACS Applied Polymer MaterialsACS Applied Polymer Materials, 2022, 4 (6), pp.4508-4519. ⟨10.1021/acsapm.2c00475⟩

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