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Academic Journal

Mechanical stress dependence of the Fermi level pinning on an oxidized silicon surface

Subjects: Silicon; Mechanical stress; Interface defect

  • Source: ISSN: 0169-4332 ; Applied Surface Science ; https://hal.archives-ouvertes.fr/hal-02319831 ; Applied Surface Science, Elsevier, 2019, 478, pp.284-289. ⟨10.1016/j.apsusc.2019.01.207⟩.

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