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Authors :
Niu Z; The Laboratory of Theoretical and Computational Chemistry, School of Chemistry and Chemical Engineering, Yantai University, Yantai 264005, China.; Wu Q
Subjects: Oxides* ; Electrons*; Lewis Bases
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Source:
International journal of molecular sciences [Int J Mol Sci] 2023 Jul 25; Vol. 24 (15). Date of Electronic Publication: 2023 Jul 25.Publisher: MDPI Country of Publication: Switzerland NLM ID: 101092791 Publication Model: Electronic Cited Medium: Internet ISSN: 1422-0067
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Authors :
Varadwaj PR; Department of Chemical System Engineering, School of Engineering, The University of Tokyo, 7-3-1, Tokyo 113-8656, Japan.; School of Chemistry, Molecular Sciences Institute, University of the Witwatersrand, Johannesburg 2050, South Africa.
Subjects: Hydrogen* ; Oxides*; Models, Molecular
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Source:
International journal of molecular sciences [Int J Mol Sci] 2023 Jun 23; Vol. 24 (13). Date of Electronic Publication: 2023 Jun 23.Publisher: MDPI Country of Publication: Switzerland NLM ID: 101092791 Publication Model: Electronic Cited Medium: Internet ISSN: 1422-0067
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Authors :
Carrasco-Busturia D; Department of Energy Conversion and Storage, Technical University of Denmark, Anker Engelunds Vej. Building 301, 2800 Kgs., Lyngby, Denmark.; Sánchez-Movellán I
Subjects: Copper*/Copper*/Copper*/chemistry ; Oxides*
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Source:
Chemistry (Weinheim an der Bergstrasse, Germany) [Chemistry] 2023 Jan 24; Vol. 29 (5), pp. e202202933. Date of Electronic Publication: 2022 Dec 05.Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 9513783 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1521-3765
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