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Academic Journal

Does Etching of the Enamel with the Rubbing Technique Promote the Bond Strength of a Universal Adhesive System?

Subjects: etching; phosphoric acid; universal adhesive

  • Source: ISSN: 1526-3711 ; The journal of contemporary dental practice ; https://hal.science/hal-03567309 ; The journal of contemporary dental practice, 2020, 21 (10.

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Academic Journal

Does Etching of the Enamel with the Rubbing Technique Promote the Bond Strength of a Universal Adhesive System?

Subjects: etching; phosphoric acid; universal adhesive

  • Source: ISSN: 1526-3711 ; The journal of contemporary dental practice ; https://hal.science/hal-03567309 ; The journal of contemporary dental practice, 2020, 21 (10.

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Academic Journal

Stress-dependent electrical transport and its universal scaling in granular materials

Subjects: RC network; contact mechanics; granular materials

  • Source: ISSN: 2352-4316 ; Extreme Mechanics Letters ; https://hal.science/hal-02329171 ; Extreme Mechanics Letters, 2018, 22, pp.83-88. ⟨10.1016/j.eml.2018.05.005⟩ ;

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Academic Journal

Stress-dependent electrical transport and its universal scaling in granular materials

Subjects: RC network; contact mechanics; granular materials

  • Source: ISSN: 2352-4316 ; Extreme Mechanics Letters ; https://hal.archives-ouvertes.fr/hal-02329171 ; Extreme Mechanics Letters, Elsevier, 2018, 22, pp.83-88. ⟨10.1016/j.eml.2018.05.005⟩.

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Conference

Effective field and universal mobility in high-k metal gate UTBB-FDSOI devices

Subjects: coefficient η; silicon transistor mobility; FDSOI universal mobilityUdine; Italy

  • Source: 2014 ICMTS Proceedings27th International Conference on Microelectronic Test Structures (ICMTS)https://hal.science/hal-0110247427th International Conference on Microelectronic Test

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Conference

Effective field and universal mobility in high-k metal gate UTBB-FDSOI devices

Subjects: coefficient η; silicon transistor mobility; FDSOI universal mobilityUdine; Italy

  • Source: 2014 ICMTS Proceedings27th International Conference on Microelectronic Test Structures (ICMTS)https://hal.science/hal-0110247427th International Conference on Microelectronic Test

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Conference

Effective field and universal mobility in high-k metal gate UTBB-FDSOI devices

Subjects: coefficient η; silicon transistor mobility; FDSOI universal mobilityUdine; Italy

  • Source: 2014 ICMTS Proceedings27th International Conference on Microelectronic Test Structures (ICMTS)https://hal.science/hal-0110247427th International Conference on Microelectronic Test

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Conference

Effective field and universal mobility in high-k metal gate UTBB-FDSOI devices

Subjects: coefficient η; silicon transistor mobility; FDSOI universal mobilityUdine; Italy

  • Source: 2014 ICMTS Proceedings27th International Conference on Microelectronic Test Structures (ICMTS)https://hal.science/hal-0110247427th International Conference on Microelectronic Test

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Conference

Effective field and universal mobility in high-k metal gate UTBB-FDSOI devices

Subjects: coefficient η; silicon transistor mobility; FDSOI universal mobilityUdine; Italy

  • Source: 2014 ICMTS Proceedings27th International Conference on Microelectronic Test Structures (ICMTS)https://hal.science/hal-0110247427th International Conference on Microelectronic Test

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Conference

Effective field and universal mobility in high-k metal gate UTBB-FDSOI devices

Subjects: coefficient η; silicon transistor mobility; FDSOI universal mobilityUdine; Italy

  • Source: 2014 ICMTS Proceedings27th International Conference on Microelectronic Test Structures (ICMTS)https://hal.science/hal-0110247427th International Conference on Microelectronic Test

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Conference

Effective field and universal mobility in high-k metal gate UTBB-FDSOI devices

Subjects: FDSOI universal mobility; effective field; coefficient ηUdine; Italy

  • Source: 2014 ICMTS Proceedings27th International Conference on Microelectronic Test Structures (ICMTS)https://hal.archives-ouvertes.fr/hal-0110247427th International Conference on

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Conference

A universal spintronic technology based on Multifunctional Standardized Stack

Subjects: [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsGrenoble; France

  • Source: 2020 Design, Automation & Test in Europe Conference & Exhibition (DATE)DATE 2020 - 23rd Design, Automation and Test in Europe Conference and Exhibitionhttps://hal.science/hal-03753403

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Conference

A universal spintronic technology based on Multifunctional Standardized Stack

Subjects: [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsGrenoble; France

  • Source: 2020 Design, Automation & Test in Europe Conference & Exhibition (DATE)DATE 2020 - 23rd Design, Automation and Test in Europe Conference and Exhibitionhttps://hal.science/hal-03753403

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Conference

A universal spintronic technology based on Multifunctional Standardized Stack

Subjects: [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsGrenoble; France

  • Source: 2020 Design, Automation & Test in Europe Conference & Exhibition (DATE)DATE 2020 - 23rd Design, Automation and Test in Europe Conference and Exhibitionhttps://hal.science/hal-03753403

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Conference

A universal spintronic technology based on Multifunctional Standardized Stack

Subjects: [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsGrenoble; France

  • Source: 2020 Design, Automation & Test in Europe Conference & Exhibition (DATE)DATE 2020 - 23rd Design, Automation and Test in Europe Conference and Exhibitionhttps://hal.science/hal-03753403

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Conference

A universal spintronic technology based on Multifunctional Standardized Stack

Subjects: [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsGrenoble; France

  • Source: 2020 Design, Automation & Test in Europe Conference & Exhibition (DATE)DATE 2020 - 23rd Design, Automation and Test in Europe Conference and Exhibitionhttps://hal.science/hal-03753403

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Academic Journal

Universal versus targeted additional contact precautions for multidrug-resistant organism carriage for patients admitted to an intensive care unit

Subjects: Acquisition; Infection; Screening

  • Source: ISSN: 0196-6553 ; American Journal of Infection Control ; https://hal.sorbonne-universite.fr/hal-01501607 ; American Journal of Infection Control, 2017, ⟨10.1016/j.ajic.2017.02.001⟩.

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Academic Journal

Universal versus targeted additional contact precautions for multidrug-resistant organism carriage for patients admitted to an intensive care unit

Subjects: Screening; Isolation; Acquisition

  • Source: ISSN: 0196-6553 ; American Journal of Infection Control ; https://hal.sorbonne-universite.fr/hal-01501607 ; American Journal of Infection Control, Elsevier, 2017,

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Academic Journal

Investigating insecticide resistance and knock-down resistance (kdr) mutation in Dielmo, Senegal, an area under long lasting insecticidal-treated nets universal coverage for 10 years

Subjects: Senegal; Dielmo; Vector control

  • Source: ISSN: 1475-2875 ; Malaria Journal ; https://hal.archives-ouvertes.fr/hal-01780669 ; Malaria Journal, BioMed Central, 2018, 17, pp.123. ⟨10.1186/s12936-018-2276-7⟩.

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