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  • 1-10 ل  120 نتائج ل ""Silicon""

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Collection : Universite D'orleans
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Conference

Characterization and Seebeck coefficient of mesoporous silicon: effect of nanographene incorporation

Subjects: mesoporous silicon; electrochemical etching; nanographene incorporationPrague; Czech Republic

  • Source: 19th European Conference on Thermoelectrics (ECT 2023)https://hal.science/hal-0422986919th European Conference on Thermoelectrics (ECT 2023), Sep 2023, Prague, Czech Republic

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Academic Journal

Silicon Oxynitride Coatings Are Very Promising for Inert and Durable Pharmaceutical Glass Vials

Subjects: Silicon oxynitride coatings; Corrosion barrier; Pharmaceutical vials

  • Source: EISSN: 2771-9545 ; ACS Applied Engineering Materials ; https://hal.science/hal-04336271 ; ACS Applied Engineering Materials, In press, 1 (10), pp.2707-2722. ⟨10.1021/acsaenm.3c00584⟩

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Academic Journal

Beyond surface nanoindentation: Combining static and dynamic nanoindentation to assess intrinsic mechanical properties of chemical vapor deposition amorphous silicon oxide (SiOx) and silicon oxycarbide (SiOxCy) thin films

Subjects: chemical vapor deposition coatings; nanoindentation; models

  • Source: ISSN: 0040-6090 ; Thin Solid Films ; https://hal.science/hal-03324004 ; Thin Solid Films, 2021, 735, pp.138844. ⟨10.1016/j.tsf.2021.138844⟩.

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Academic Journal

Hydrogenated Silicon Nanoclusters with a Permanent Electric Dipole Moment for the Controlled Assembly of Silicon-Based Nanostructures ; Nanoclusters de silicium hydrogéné avec un moment dipolaire électrique permanent pour l'assemblage contrôlé de nanostructures à base de silicium

Subjects: hydrogenated silicon nanoclusters; thin silicon films; permanent electric dipole moment

  • Source: ISSN: 2574-0970 ; ACS Applied Nano Materials ; https://hal.science/hal-03448787 ; ACS Applied Nano Materials, 2021, ⟨10.1021/acsanm.1c02754⟩.

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Academic Journal

Critical Level of Nitrogen Incorporation in Silicon Oxynitride Films: Transition of Structure and Properties, toward Enhanced Anticorrosion Performance

Subjects: silicon oxynitride; tris(dimethylsilyl)amine; chemical vapor deposition

  • Source: ISSN: 2637-6113 ; ACS Applied Electronic Materials ; https://hal.science/hal-03657402 ; ACS Applied Electronic Materials, 2022, 4 (4), pp.1741 - 1755. ⟨10.1021/acsaelm.2c00018⟩.

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Academic Journal

An innovative kinetic model allowing insight in the moderate temperature chemical vapor deposition of silicon oxynitride films from tris(dimethylsilyl)amine

Subjects: Computational fluid dynamics; Kinetic model; Silanamine precursor

  • Source: ISSN: 1385-8947 ; Chemical Engineering Journal ; https://cnrs.hal.science/hal-03514135 ; Chemical Engineering Journal, 2021, 431, pp.133350. ⟨10.1016/j.cej.2021.133350⟩.

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Academic Journal

Micro-spikes formed on mesoporous silicon by UV picosecond laser irradiation

Subjects: Mesoporous silicon; picosecond laser beam; micro-texturing

  • Source: ISSN: 0169-4332.

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Academic Journal

Cryogenic etching of silicon compounds using a CHF 3 based plasma

Subjects: Cryoetching; [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci]; [SPI.GPROC]Engineering Sciences [physics]/Chemical and Process Engineering

  • Source: ISSN: 0021-8979.

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Academic Journal

Microstructural characterization and thermal stability of He charged amorphous silicon films prepared by magnetron sputtering in helium

Subjects: [CHIM.MATE]Chemical Sciences/Material chemistry

  • Source: ISSN: 0254-0584 ; Materials Chemistry and Physics ; https://hal.science/hal-04172285 ; Materials Chemistry and Physics, 2023, 301, pp.127674. ⟨10.1016/j.matchemphys.2023.127674⟩.

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Academic Journal

Impregnation of High-Magnetization FeCo Nanoparticles in Mesoporous Silicon: An Experimental Approach

Subjects: impregnation; magnetic nanoparticles; mesoporous silicon

  • Source: EISSN: 2296-2646 ; Frontiers in Chemistry ; https://hal.insa-toulouse.fr/hal-02001841 ; Frontiers in Chemistry, 2018, 6, pp.609. ⟨10.3389/fchem.2018.00609⟩

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  • 1-10 ل  120 نتائج ل ""Silicon""