Source: ISSN: 0734-2101 ; Journal of Vacuum Science & Technology A ; https://hal.univ-grenoble-alpes.fr/hal-03449060 ; Journal of Vacuum Science & Technology A, 2021, 39 (3), pp.032416.

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Academic Journal

Space Weathering on Inner Planetary Surface Analogues Induced by Swift Multicharged Heavy Ion Bombardment

Authors : Martinez, R.; Agnihotri, A.; da Silveira, E.F. ...

Subjects: Mercury; Cosmic rays; Solar wind

Source: ISSN: 0019-1035.

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Academic Journal

Organosulfur Compounds Formed by Sulfur Ion Bombardment of Astrophysical Ice Analogs: Implications for Moons, Comets, and Kuiper Belt Objects

Authors : Ruf, Alexander; Bouquet, Alexis; Boduch, Philippe ...

Subjects: [SDU.ASTR]Sciences of the Universe [physics]/Astrophysics [astro-ph]; [PHYS.ASTR.EP]Physics [physics]/Astrophysics [astro-ph]/Earth and Planetary Astrophysics [astro-ph.EP]

Source: ISSN: 2041-8205.

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Suppression of self-organized surface nanopatterning on GaSb/InAs multilayers induced by low energy oxygen ion bombardment by using simultaneously sample rotation and oxygen flooding

Authors : Beainy, Georges; Cerba, Tiphaine; Bassani, Franck ...

Subjects: Depth profiling; III-V heterostructures; ToF-SIMS

Source: ISSN: 0169-4332.

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Dissertation/ Thesis

Development of new etching technologies highlight the stochasticity of the ion bombardment during industrial plasma processes ; Développement de nouvelles technologies de gravure : mise en évidence de la stochasticité du bombardement ionique lors de procédés plasma industriels

Authors : Mourey, Odile;

Subjects: Etching; Processes; Plasma

Source: https://theses.hal.science/tel-02905449 ; Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes, 2017. Français. ⟨NNT : 2017GREAT027⟩.

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Dissertation/ Thesis

Ion-surface interaction : simulation of plasma-wall interaction (ITER) ; Interaction ion‐surface : simulation de l'interaction plasma‐paroi (ITER)

Authors : Salou, Pierre;

Subjects: Sputtering (physics); Surface (physics); Ion bombardment

Source: https://theses.hal.science/tel-00915747 ; Science des matériaux [cond-mat.mtrl-sci]. Université de Caen, 2013. Français. ⟨NNT : ⟩.

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Dissertation/ Thesis

III-V materials plasma-etching process development for power devices ; Développement d'un procédé de gravure par plasma pour les transistors de puissance à base de matériaux III-V

Authors : Pezeril, Maxime;

Subjects: Plasma Etching; Transistors; Atomic Layer Etching

Source: https://theses.hal.science/tel-04740728 ; Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes [2020-.], 2024. Français. ⟨NNT : 2024GRALT049⟩.

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Dissertation/ Thesis

Gallium Nitride (GaN) plasma etch for high efficiency µLED applications ; Gravure Plasma du Nitrure de Gallium pour la réalisation de micro LEDs à hautes performances

Authors : Catala, Antoine;

Subjects: Gallium Nitride; Dry etch; MicroLED

Source: https://theses.hal.science/tel-04709947 ; Micro et nanotechnologies/Microélectronique. Université Grenoble Alpes [2020-.], 2024. Français. ⟨NNT : 2024GRALT041⟩.

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Academic Journal

Heavy ion radiolysis of the chiral terpene $\alpha$-pinene

Authors : de Barros, A, L. F.; Ricca, A.; Bychkova, A. ...

Subjects: astrochemistry; methods: laboratory: solid state; astronomical instrumentation

Source: ISSN: 0035-8711.

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Comparative study of deuterium retention in irradiated Eurofer and Fe–Cr from a new ion implantation materials facility

Authors : Hollingsworth, A.; Lavrentiev, M.Yu.; Watkins, R. ...

Subjects: Tritium; deuterium; Eurofer

Source: ISSN: 0029-5515.

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نتائج البحث

فلترة النتائج

Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance

Space Weathering on Inner Planetary Surface Analogues Induced by Swift Multicharged Heavy Ion Bombardment

Organosulfur Compounds Formed by Sulfur Ion Bombardment of Astrophysical Ice Analogs: Implications for Moons, Comets, and Kuiper Belt Objects

Suppression of self-organized surface nanopatterning on GaSb/InAs multilayers induced by low energy oxygen ion bombardment by using simultaneously sample rotation and oxygen flooding

Development of new etching technologies highlight the stochasticity of the ion bombardment during industrial plasma processes ; Développement de nouvelles technologies de gravure : mise en évidence de la stochasticité du bombardement ionique lors de procédés plasma industriels

Ion-surface interaction : simulation of plasma-wall interaction (ITER) ; Interaction ion‐surface : simulation de l'interaction plasma‐paroi (ITER)

III-V materials plasma-etching process development for power devices ; Développement d'un procédé de gravure par plasma pour les transistors de puissance à base de matériaux III-V

Gallium Nitride (GaN) plasma etch for high efficiency µLED applications ; Gravure Plasma du Nitrure de Gallium pour la réalisation de micro LEDs à hautes performances

Heavy ion radiolysis of the chiral terpene $\alpha$-pinene

Comparative study of deuterium retention in irradiated Eurofer and Fe–Cr from a new ion implantation materials facility

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