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Sparse identification modeling and predictive control of wafer temperature in an atomic layer etching reactor

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اقرأ أكثر حفظ في قائمتي
  • معلومة اضافية
    • بيانات النشر:
      eScholarship, University of California, 2024.
    • الموضوع:
      2024
    • File Description:
      application/pdf
    • Rights:
      public
    • الرقم المعرف:
      edssch.oai:escholarship.org:ark:/13030/qt0j25292c