In-polar InN grown by plasma-assisted molecular beam epitaxy

We study the effect of different deposition conditions on the properties of In-polar InN grown by plasma-assisted molecular beam epitaxy. GaN buffer layers grown in the Ga-droplet regime prior to the InN deposition significantly improved the surface morphology of InN films grown with excess In flux. Using this approach, In-polar InN films have been realized with room temperature electron mobilities as high as 2250 cm(2)/V s. We correlate electron concentrations in our InN films with the unintentionally incorporated impurities, oxygen and hydrogen. A surface electron accumulation layer of 5.11x10(13) cm(-2) is measured for In-polar InN. Analysis of optical absorption data provides a band gap energy of similar to 0.65 eV for the thickest InN films. (c) 2006 American Institute of Physics.