- Patent Number:
12066,331
- Appl. No:
18/227723
- Application Filed:
July 28, 2023
- نبذة مختصرة :
There is provided a polarization analysis apparatus that adjusts an angle of incidence or a numerical aperture by using an aperture. The apparatus includes: a first aperture that transmits a lighting beam reflected from a sample on a substrate; a second aperture that transmits a lighting beam having passed through the first aperture; and a detector that detects a lighting beam having passed through the second aperture and selects an angle of incidence of the lighting beam and numerical apertures of the first aperture and the second aperture.
- Inventors:
AUROS TECHNOLOGY, INC. (Hwaseong-si, KR)
- Assignees:
AUROS TECHNOLOGY, INC. (Hwaseong-si, KR)
- Claim:
1. A polarization analysis apparatus that adjusts an angle of incidence or a numerical aperture by using an aperture, comprising: a first aperture that operates in a first direction perpendicular to a beam direction in which a lighting beam proceeds and transmits the lighting beam reflected from a sample on a substrate, wherein the first aperture comprises a plurality of circular plates, and each of the circular plates has a hole that is formed in a direction parallel with the first direction, transmits the lighting beam and controls an angle of incidence of the lighting beam; a second aperture that operates in a second direction perpendicular to the first direction and the beam direction and that transmits the lighting beam having passed through a circulate plate-shaped hole which is included in the first aperture, wherein the second aperture comprises a plurality of slits having different sizes, and the slits are arranged in a line along a direction parallel with the second direction and adjust a numerical aperture of the lighting beam; and a detector that detects the lighting beam having passed through the second aperture.
- Claim:
2. The polarization analysis apparatus of claim 1 , wherein the plurality of circular plates of the first aperture comprises five rotating plates, and each of the five rotating plates has a hole that transmits the lighting beam reflected from the sample and that is spaced from each other to control the angel of incidence in a discontinuous range.
- Claim:
3. The polarization analysis apparatus of claim 2 , wherein the first direction in which the first aperture operates is a direction in which the five rotating plates are disposed.
- Claim:
4. The polarization analysis apparatus of claim 2 , wherein each of the five rotating plates of the first aperture rotates to transmit the lighting beam through the hole that is formed on each of the five rotating plates, and the hole formed on each of the five rotating plates is formed in a different position, in a counterclockwise direction, based on an order in which the five rotating plates are disposed.
- Claim:
5. The polarization analysis apparatus of claim 1 , further comprising an analyzer that directs the lighting beam having passed through the second aperture to the detector.
- Claim:
6. The polarization analysis apparatus of claim 1 , wherein the detector detects properties and a thickness distribution of the sample through the lighting beam detected based on a movement of at least one of the first aperture and the second aperture.
- Claim:
7. The polarization analysis apparatus of claim 1 , wherein the first aperture and the second aperture are disposed in a direction that is perpendicular to a direction along which the lighting beam reflected from the sample is directed to an analyzer.
- Claim:
8. The polarization analysis apparatus of claim 1 , further comprising: a light emitting device that outputs the lighting beam; and a polarization device directing the lighting beam output from the light emitting device to the sample on the substrate.
- Claim:
9. The polarization analysis apparatus of claim 8 , wherein the light emitting device adjusts an angle at which the lighting beam emits, based on the angle of incidence detected by the detector.
- Claim:
10. The polarization analysis apparatus of claim 1 , wherein the second aperture comprises a first sub aperture and a second sub aperture that are provided to adjust a size of a slit, based on a movement.
- Claim:
11. The polarization analysis apparatus of claim 10 , wherein any one of the first sub aperture and the second sub aperture is disposed in front of or behind the other sub aperture, and the size of the slit is adjusted based on a movement in the second direction.
- Claim:
12. A method in which a polarization analysis apparatus adjusts an angle of incidence or a numerical aperture by using an aperture, comprising: a first step of operating in a first direction perpendicular to a beam direction in which a lighting beam proceeds and transmitting the lighting beam reflected from a sample on a substrate, by a first aperture; a second step of operating in a second direction perpendicular the first direction and the beam direction and transmitting the lighting beam having passed through a circular plate-shaped hole which is included in the first aperture, by a second aperture; and a third step of detecting the lighting beam having passed through the second aperture, by a detector, wherein the first aperture comprises a plurality of circular plates, and each of the circular plates has a hole that is formed in a direction parallel with the first direction, transmits the lighting beam and controls an angle of incidence of the lighting beam, and the second aperture comprises a plurality of slits having different sizes, and the slits are arranged in a line along a direction parallel with the second direction and adjust a numerical aperture of the lighting beam.
- Claim:
13. The method of claim 12 , wherein the third step comprises detecting properties and a thickness distribution of the sample, based on the lighting beam detected based on a movement of at least one of the first aperture and the second aperture.
- Patent References Cited:
8139232 March 2012 Wolf
20090059228 March 2009 Horie
20090066953 March 2009 Horie
20200025678 January 2020 Rapaport
20200098486 March 2020 Coenen
20200232903 July 2020 Borri
20200363332 November 2020 Antonelli
2905448 June 1999
H11-316163 November 1999
2008-139613 June 2008
2020-500289 January 2020
10-2008-0114331 December 2008
10-2015-0011313 January 2015
10-1800471 November 2017
10-2134943 August 2020
- Other References:
Korean Office Action for related KR Application No. 10-2022-0048486 mailed Aug. 24, 2022 from Korean Intellectual Property Office. cited by applicant
Korean Office Action for related KR Application No. 10-2022-0048486 mailed Dec. 27, 2022 from Korean Intellectual Property Office. cited by applicant
Korean Notice of Allowance for related KR Application No. 10-2022-0048486 mailed Jan. 18, 2023 from Korean Intellectual Property Office. cited by applicant
- Primary Examiner:
Punnoose, Roy M
- Attorney, Agent or Firm:
Paratus Law Group, PLLC
- الرقم المعرف:
edspgr.12066331
Processing Request
No Comments.