Illumination source and associated metrology apparatus

12044,951

17/769725

October 07, 2020

Disclosed is an illumination source comprising a gas delivery system comprising a gas nozzle. The gas nozzle comprises an opening in an exit plane of the gas nozzle. The gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region. The illumination source is configured to receive a pump radiation having a propagation direction and to provide the pump radiation in the gas flow. A geometry shape of the gas nozzle is adapted to shape a profile of the gas flow such that gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.

ASML Netherlands B.V. (Veldhoven, NL)

ASML Netherlands B.V. (Veldhoven, NL)

1. An illumination source comprising: a gas delivery system comprising a gas nozzle, and wherein the gas nozzle comprises an opening in an exit plane of the gas nozzle, wherein the gas delivery system is configured to provide a gas flow from the opening operable to generate an emitted radiation at an interaction region, and a gas shaping element disposed entirely between the exit plane and a pump radiation having a propagation direction and configured to alter a profile of the gas flow, wherein the illumination source is configured to receive the pump radiation and to provide the pump radiation in the gas flow.

2. The illumination source of claim 1 , wherein a geometrical shape of the gas nozzle is adapted to shape the profile of the gas flow, such that a gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.

3. The illumination source of claim 2 , wherein: the profile of the gas flow is to suppress an energy divergence of the pump radiation inside the gas flow, and the energy divergence is caused by a portion of the gas flow being ionized by the pump radiation.

4. The illumination source of claim 2 , wherein the maximum value is above a phase-matching pressure.

5. The illumination source of claim 2 , wherein a cut-off region length of the profile of the gas flow in the propagation direction of the pump radiation is less than 100 μm.

6. The illumination source of claim 1 , wherein: a width of the opening gradually increases along the propagation direction of the pump radiation, and a shape of the opening is a trapezoid or an isosceles trapezoid.

7. The illumination source of claim 1 , wherein an interior cross-sectional area of the gas nozzle in a plane parallel to the exit plane increases along a direction of the gas flow for at least a portion of the gas nozzle.

8. The illumination source of claim 1 , wherein a shape of the opening in the exit plane is asymmetric to planes perpendicular to the propagation direction of the pump radiation.

9. The illumination source of claim 1 , wherein the gas shaping element is configured to alter the profile of the gas flow during generation of the emitted radiation.

10. The illumination source of claim 1 , wherein the gas shaping element is disposed at least partly in the gas flow.

11. The illumination source of claim 1 , wherein the gas flow is provided by the gas delivery system into an evacuated or nearly evacuated space.

12. The illumination source of claim 1 , wherein: the emitted radiation has a wavelength in X-ray or EUV range, and the wavelength is in a range from 0.01 nm to 100 nm, from 0.1 nm to 100 nm, from 1 nm to 100 nm, from 1 nm to 50 nm, or from 10 nm to 20 nm.

13. The illumination source of claim 1 , wherein the illumination source comprises a temperature controlling assembly.

14. A metrology apparatus or a lithographic cell comprising: an illumination source comprising: a gas delivery system comprising a gas nozzle, and wherein the gas nozzle comprises an opening in an exit plane of the gas nozzle, and wherein the gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region, and a gas shaping element disposed entirely between the exit plane and a pump radiation havving a propagation direction and configured to alter a profile of the gas flow, wherein the illumination source is configured to receive the pump radiation and to provide the pump radiation in the gas flow.

15. The metrology apparatus or the lithographic cell of claim 14 , wherein a shape of the opening in the exit plane is asymmetric to planes perpendicular to the propagation direction of the pump radiation.

16. A method comprising: providing a gas flow from an opening in an exit plane of a gas nozzle for receiving a pump radiation having a propagation direction and for generating an emitted radiation at an interaction region; and using a gas shaping element of the gas nozzle disposed entirely between the exit plane and the pump radiation to shape a profile of the gas flow, such that a gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.

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