Item request has been placed!
×
Item request cannot be made.
×
![loading](/sites/all/modules/hf_eds/images/loading.gif)
Characterization of Low-Frequency Noise in Polycrystalline Silicon Thin-Film Transistors Under Different Temperature
Item request has been placed!
×
Item request cannot be made.
×
![loading](/sites/all/modules/hf_eds/images/loading.gif)
- نوع التسجيلة:Electronic Resource
- الدخول الالكتروني :
https://repository.hkust.edu.hk/ir/Record/1783.1-113226 https://doi.org/10.1109/ISNE48910.2021.9493595 http://lbdiscover.ust.hk/uresolver?url_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rfr_id=info:sid/HKUST:SPI&rft.genre=article&rft.issn=&rft.volume=&rft.issue=&rft.date=2021&rft.spage=&rft.aulast=Yang&rft.aufirst=&rft.atitle=Characterization+of+Low-Frequency+Noise+in+Polycrystalline+Silicon+Thin-Film+Transistors+under+Different+Temperature&rft.title=2021+9th+International+Symposium+on+Next+Generation+Electronics%2C+ISNE+2021 http://www.scopus.com/record/display.url?eid=2-s2.0-85112363907&origin=inward
No Comments.