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Modifying of etching anisotropy of silicon substrates by surface active agents

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اقرأ أكثر حفظ في قائمتي
  • معلومة اضافية
    • بيانات النشر:
      De Gruyter, 2011.
    • الموضوع:
      2011
    • Collection:
      LCC:Physics
    • File Description:
      electronic resource
    • ISSN:
      2391-5471
    • Relation:
      https://doaj.org/toc/2391-5471
    • الرقم المعرف:
      10.2478/s11534-010-0114-9
    • الرقم المعرف:
      edsdoj.892714ff1644b568df00bf91aa0be7f