Redalyc.Laser deposition of CNx films combined with RF and hollow cathode discharges

Pulsed laser deposition (PLD) combined with additional RF and hollow cathode (HC) discharges for deposition of CN x films are studied. The RF discharge was held between two electrodes situated parallel to plasma plume from a graphite target. Influence of RF power, nitrogen pressure, modulation frequency and modulation pulse rate on nitrogen content was observed. The production of nitrogen species in the RF discharge was observed by optical emission spectroscopy (OES). In PLD combined with RF and HC discharges one of the RF electrodes was used to supply nitrogen gas on the substrate. Films were characterized by WDX, XRD and by scratch and microhardness testers. The nitrogen content in CN x films sharply increased with additional discharges. An N/C ratio higher than 1.1 was measured.