نبذة مختصرة : Semiconducting 2D materials, such as SnS2, hold immense potential for many applications ranging from electronics to catalysis. However, deposition of few-layer SnS2 films has remained a great challenge. Herein, continuous wafer-scale 2D SnS2 films with accurately controlled thickness (2 to 10 monolayers) are realized by combining a new atomic layer deposition process with low-temperature (250 degrees C) postdeposition annealing. Uniform coating of large-area and 3D substrates is demonstrated owing to the unique self-limiting growth mechanism of atomic layer deposition. Detailed characterization confirms the 1T-type crystal structure and composition, smoothness, and continuity of the SnS2 films. A two-stage deposition process is also introduced to improve the texture of the films. Successful deposition of continuous, high-quality SnS2 films at low temperatures constitutes a crucial step toward various applications of 2D semiconductors. ; Peer reviewed
Relation: The research was supported by ASM Microchemistry and the Finnish Centre of Excellence in Atomic Layer Deposition funded by the Academy of Finland. TEM sample preparation and imaging as well as EDS measurements were performed by EAG Laboratories. V.R.D. and J.T.G. acknowledge the Engineering and Physical Sciences Research Council (EPSRC) (Grant Nos. EP/J021229/1 and EP/N015800/1) for support.; Mattinen , M , King , P J , Khriachtchev , L , Meinander , K , Gibbon , J T , Dhanak , V R , Räisänen , J , Ritala , M & Leskelä , M 2018 , ' Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films ' , Small , vol. 14 , no. 21 , 1800547 . https://doi.org/10.1002/smll.201800547; ORCID: /0000-0002-6210-2980/work/46037163; ORCID: /0000-0002-1146-5212/work/46037528; ORCID: /0000-0003-4837-1823/work/49416849; ORCID: /0000-0001-5830-2800/work/46037155; 85047931662; 54eb11cb-c27a-4464-840b-748e0ea9bbf2; http://hdl.handle.net/10138/302076; 000434173300021
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