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The influence of crystallographic orientation on the wetting of silicon on quartz single crystals

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اقرأ أكثر حفظ في قائمتي
  • معلومة اضافية
    • بيانات النشر:
      Springer Verlag
    • الموضوع:
      2011
    • Collection:
      Institutional Repository of Leibniz Universität Hannover
    • نبذة مختصرة :
      Dynamic hexagonal spreading patterns of small silicon droplets on the basal plane (001) of quartz were observed by video microscopy. A detailed analysis of the hexagonal triple line demonstrates that the patterns show slight chiral distortions that can be attributed to the screw axis of the substrate crystal. This article reveals the detailed influence of crystal symmetry on the anisotropy of reactive wetting. In this context, a first discussion about the interplay of wetting and etching of a crystal is provided.
    • ISSN:
      0022-2461
    • Relation:
      http://dx.doi.org/10.15488/1676; http://www.repo.uni-hannover.de/handle/123456789/1701
    • الرقم المعرف:
      10.15488/1676
    • الدخول الالكتروني :
      http://www.repo.uni-hannover.de/handle/123456789/1701
      https://doi.org/10.15488/1676
    • Rights:
      CC BY-NC 3.0 Unported ; https://creativecommons.org/licenses/by-nc/3.0/ ; frei zugänglich
    • الرقم المعرف:
      edsbas.C7DA9A47