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Thin metal films on weakly-interacting substrates : Nanoscale growth dynamics, stress generation, and morphology manipulation ; Couches minces métalliques sur substrats à faible interaction : Dynamics nanométriques de croissance, contraintes résiduelles, et manipulation de morphologie

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  • معلومة اضافية
    • بيانات النشر:
      Linköpings universitet, Nanodesign
      Linköpings universitet, Tekniska fakulteten
      Institut Pprime, Département Physique et Mécanique des Matériaux, Université de Poitiers, Poitiers, France
      Linköping
    • الموضوع:
      2020
    • Collection:
      Linköping University Electronic Press (LiU E-Press)
    • نبذة مختصرة :
      Vapor-based growth of thin metal films with controlled morphology on weakly-interacting substrates (WIS), including oxides and van der Waals materials, is essential for the fabrication of multifunctional metal contacts in a wide array of optoelectronic devices. Achieving this entails a great challenge, since weak film/substrate interactions yield a pronounced and uncontrolled 3D morphology. Moreover, the far-from-equilibrium nature of vapor-based film growth often leads to generation of mechanical stress, which may further compromise device reliability and functionality. The objectives of this thesis are related to metal film growth on WIS and seek to: (i) contribute to the understanding of atomic-scale processes that control film morphological evolution; (ii) elucidate the dynamic competition between nanoscale processes that govern film stress generation and evolution; and (iii) develop methodologies for manipulating and controlling nanoscale film morphology between 2D and 3D. Investigations focus on magnetron sputter-deposited Ag and Cu films on SiO2 and amorphous carbon (a-C) substrates. Research is conducted by strategically combining of in situ and real-time film growth monitoring, ex situ chemical and (micro)-structural analysis, optical modelling, and deterministic growth simulations. In the first part, the scaling behavior of characteristic morphological transition thicknesses (i.e., percolation and continuous film formation thickness) during growth of Ag and Cu films on a-C are established as function of deposition rate and temperature. These data are interpreted using a theoretical framework based on the droplet growth theory and the kinetic freezing model for island coalescence, from which the diffusion rates of film forming species during Ag and Cu growth are estimated. By combining experimental data with ab initio molecular dynamics simulations, diffusion of multiatomic clusters, rather than monomers, is identified as the rate-limiting structure-forming process. In the second part, the effect of ...
    • File Description:
      application/pdf
    • ISBN:
      978-91-7929-820-3
      91-7929-820-6
    • Relation:
      Linköping Studies in Science and Technology. Dissertations, 0345-7524; 2084; http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-168458; urn:isbn:9789179298203
    • الرقم المعرف:
      10.3384/diss.diva-168458
    • الدخول الالكتروني :
      http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-168458
      https://doi.org/10.3384/diss.diva-168458
    • Rights:
      info:eu-repo/semantics/openAccess
    • الرقم المعرف:
      edsbas.B04ACD79