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Random phase mask in a filamentation regime: application to the localization of point sources

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  • معلومة اضافية
    • Contributors:
      ONERA - The French Aerospace Lab Châtillon; ONERA-Université Paris Saclay (COmUE); Laboratoire Charles Fabry / Scop; Laboratoire Charles Fabry (LCF); Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS)-Université Paris-Sud - Paris 11 (UP11)-Institut d'Optique Graduate School (IOGS)-Centre National de la Recherche Scientifique (CNRS); LCFIO/SCOp/SPim; ONERA/DOTA
    • بيانات النشر:
      HAL CCSD
      Optical Society of America - OSA Publishing
    • الموضوع:
      2012
    • Collection:
      ONERA: HAL (Centre français de recherche aérospatiale / French Aerospace Lab)
    • نبذة مختصرة :
      International audience ; We present a optical system with an extended point-spread function (PSF) for the localization of point sources in the visible and IR spectral ranges with a subpixel precision. This compact system involves a random phase mask (RPM) as its unique component. It exhibits original properties, because this RPM is used in a particular regime, called the ''filamentation regime,'' before the speckle region. The localization is performed by calculating the phase correlation between the PSF and the image obtained under off-axis illumination. Numerical simulations are presented to assess the basic optical properties of this RPM in the filamentation regime.
    • Relation:
      hal-00569371; https://hal.science/hal-00569371; https://hal.science/hal-00569371/document; https://hal.science/hal-00569371/file/article_V6.pdf
    • الرقم المعرف:
      10.1364/OL.36.000684
    • الدخول الالكتروني :
      https://hal.science/hal-00569371
      https://hal.science/hal-00569371/document
      https://hal.science/hal-00569371/file/article_V6.pdf
      https://doi.org/10.1364/OL.36.000684
    • Rights:
      info:eu-repo/semantics/OpenAccess
    • الرقم المعرف:
      edsbas.80D08D89