Reactivity of Hydroxyl Groups on the Surface of Solid Oxides in Atomic Layer Deposition Processes

This paper demonstrates the feasibility of using induction constants for quantitatively assessing the reactivity of hydroxyl groups on the surface of some solid oxides in the synthesis of nanostructures by molecular layering (atomic layer deposition). It is shown that a surface reaction can reach completion if hydroxyl groups have a larger induction constant than does the active group of the reagent. The proposed approach is substantiated and experimental data are presented for solid silicon, aluminum, magnesium, titanium, and beryllium oxides.